The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Nov. 16, 2009
Applicants:

Amil Oprasic, Sandviken, SE;

Lennart Wihlborg, Ockelbo, SE;

Leif Widin, Sandviken, SE;

Stefan Roman, Sandviken, SE;

Inventors:

Amil Oprasic, Sandviken, SE;

Lennart Wihlborg, Ockelbo, SE;

Leif Widin, Sandviken, SE;

Stefan Roman, Sandviken, SE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23C 5/02 (2006.01); B23C 5/20 (2006.01); B23C 5/22 (2006.01);
U.S. Cl.
CPC ...
B23C 5/207 (2013.01); B23C 5/2208 (2013.01); B23C 2200/083 (2013.01); B23C 2200/125 (2013.01); B23C 2200/162 (2013.01); B23C 2200/208 (2013.01); B23C 2210/166 (2013.01); B23C 2210/168 (2013.01);
Abstract

A double-sided, indexable face milling insert, including an upperside, an underside, and a neutral plane (NP) parallel to the upperside and the underside, the neutral plane forming a right angle with a geometrical center axis (C). A plurality of indexable cutting edges are formed along circumferential borderlines in transitions between a number of clearance surfaces and the upperside as well as the underside. Each cutting edge includes a chip-removing main edge and a surface-wiping secondary edge, the secondary edge forming an obtuse angle with the main edge in planar view. A corner clearance surface extends between and connects each pair of upper and lower secondary edges, the corner clearance surface including first and second part surfaces which each form an acute angle (η) in side elevation view with respective reference planes (RP) parallel to the neutral plane.


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