The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Jan. 28, 2010
Applicant:

Nathan G. Stoddard, Gettysburg, PA (US);

Inventor:

Nathan G. Stoddard, Gettysburg, PA (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 33/02 (2006.01); B29C 65/02 (2006.01); B29C 65/16 (2006.01); B29C 65/14 (2006.01); C30B 25/02 (2006.01); C30B 25/20 (2006.01); B32B 38/10 (2006.01); C30B 11/14 (2006.01); C30B 29/06 (2006.01); B28B 7/36 (2006.01); C30B 28/04 (2006.01); C30B 28/06 (2006.01);
U.S. Cl.
CPC ...
C30B 11/14 (2013.01); C30B 28/04 (2013.01); C30B 28/06 (2013.01); C30B 29/06 (2013.01);
Abstract

This invention relates seed layers and a process of manufacturing seed layers for casting silicon suitable for use in solar cells or solar modules. The process includes the step of positioning tiles with aligned edges to form seams on a suitable surface, and the step of joining the tiles at the seams to form a seed layer. The step of joining includes heating the tiles to melt at least a portion of the tiles, contacting the tiles at both ends of at least one seam with electrodes, using plasma deposition of amorphous silicon, applying photons to melt a portion of the tiles, and/or layer deposition. Seed layers of this invention include a rectilinear shape of at least about 500 millimeters in width and length.


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