The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Sep. 16, 2010
Taeho Kim, Cheonan-si, KR;
Boong Kim, Cheonan-si, KR;
Youngju Jeong, Asan-si, KR;
Semes Co., Ltd., Chungcheongnam-Do, KR;
Abstract
Provided is a single wafer processing apparatus for cleaning a substrate. The apparatus includes a substrate support member including a spin head to place a substrate thereon, a processing bowl disposed to surround the spin head and adapted to collect a processing fluid scattering from the substrate, and a swing nozzle unit adapted to inject the processing fluid to the substrate placed on the spin head by rotating in a swinging motion, wherein the swing nozzle unit includes a nozzle part including a nozzle body constituted by an inner resin pipe supplying an inner path where a processing fluid supply tube is disposed, a metal pipe disposed to surround the inner resin pipe, and an outer resin pipe disposed to surround the metal pipe, and a nozzle driver adapted to rotate the nozzle part in a θ-axis direction and move the nozzle part up and down in a z-axis direction.