The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Jul. 15, 2011
Keith Brian Porthouse, Sunnyvale, CA (US);
John W. Lane, San Jose, CA (US);
Mariusch Gregor, Gilroy, CA (US);
Nir Merry, Mountain View, CA (US);
Michael R. Rice, Pleasanton, CA (US);
Alex Minkovich, Campbell, CA (US);
Hongbin LI, Mountain View, CA (US);
Dmitry A. Dzilno, Sunnyvale, CA (US);
Keith Brian Porthouse, Sunnyvale, CA (US);
John W. Lane, San Jose, CA (US);
Mariusch Gregor, Gilroy, CA (US);
Nir Merry, Mountain View, CA (US);
Michael R. Rice, Pleasanton, CA (US);
Alex Minkovich, Campbell, CA (US);
Hongbin Li, Mountain View, CA (US);
Dmitry A. Dzilno, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus are disclosed herein. In some embodiments, methods of controlling process chambers may include predetermining a relationship between pressure in a processing volume and a position of an exhaust valve as a function of a process parameter; setting the process chamber to a first state having a first pressure in the processing volume and a first value of the process parameter, wherein the exhaust valve is set to a first position based on the predetermined relationship to produce the first pressure at the first value; determining a pressure control profile to control the pressure as the process chamber is changed to a second state having a second pressure and a second process parameter value from the first state; and applying the pressure control profile to control the pressure by varying the position of the exhaust valve while changing the process chamber to the second state.