The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Feb. 10, 2012
Yuichiro Enomoto, Haibara-gun, JP;
Kunihiko Kodama, Haibara-gun, JP;
Shinji Tarutani, Haibara-gun, JP;
Yuichiro Enomoto, Haibara-gun, JP;
Kunihiko Kodama, Haibara-gun, JP;
Shinji Tarutani, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C).