The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Jun. 03, 2011
Yoshinori Abe, Ichihara, JP;
Yoshinori Abe, Ichihara, JP;
Toyoda Gosei Co., Ltd., Aichi, JP;
Abstract
In a modified region forming step, an element-group formation substrate () having plural semiconductor light emitting elements () formed on a substrate front surface () of a wafer substrate () is irradiated with laser light () from the substrate back surface () of the substrate, thereby forming the following inside the substrate: first and third modified regions (L) and (L) oriented in a y-direction (corresponding to a first direction) that is parallel to the surfaces of the substrate; and second and fourth modified regions (L) and (L) oriented in an x-direction (corresponding to a second direction) that is parallel to the surfaces of the substrate and differs from the y-direction. In the step, the first modified region (L), the second modified region (L), the third modified region (L) and the fourth modified region (L) are formed at different depths from the substrate back surface of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile