The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Aug. 04, 2011
Carlton Ashley Washburn, Rolla, MO (US);
James E. Lamb, Iii, Rolla, MO (US);
Brian A. Smith, Frisco, TX (US);
Justin Lee Furse, Rolla, MO (US);
Kang Le Wang, Rolla, MO (US);
Carlton Ashley Washburn, Rolla, MO (US);
James E. Lamb, III, Rolla, MO (US);
Brian A. Smith, Frisco, TX (US);
Justin Lee Furse, Rolla, MO (US);
Heping Wang, Rolla, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
Methods of forming microelectronic structures using multilayer processes are disclosed. The methods comprise the use of a developer-soluble protective layer adjacent the substrate surface in a multilayer stack to protect the substrate during pattern transfer. After etching, the pattern is transferred into the developer-soluble protective layer using a developer instead of etching required by previous methods. Conventional developer-soluble anti-reflective coatings and gap-fill materials can be used to form the protective layer. Custom layers with developer solubility can also be prepared. Microelectronic structures formed by the above processes are also disclosed.