The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2014

Filed:

Dec. 15, 2010
Applicants:

Eiji Fuchita, Chiba, JP;

Eiji Tokizaki, Chiba, JP;

Eiichi Ozawa, Chiba, JP;

Inventors:

Eiji Fuchita, Chiba, JP;

Eiji Tokizaki, Chiba, JP;

Eiichi Ozawa, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/06 (2006.01); C23C 24/04 (2006.01); B05B 7/14 (2006.01);
U.S. Cl.
CPC ...
B05B 7/1404 (2013.01); C23C 24/04 (2013.01);
Abstract

A deposition method is provided to enable fine particles having a relatively large particle diameter, for example, a diameter larger than 0.5 μm, to be stably deposited on a substrate. The fine particles with insulating surface are placed in an airtight container, and a carrier gas is introduced into the container, triboelectrically charging the fine particles and generating an aerosol of the fine particles. The fine particles are charged by friction with the inner surface of a transfer tubing connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber that is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate placed in the deposition chamber.


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