logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8877021 B1

PDFFull Text
Date of Patent:
Nov. 04, 2014

Filed:

Mar. 10, 2006

Chromic oxide powder for sputtering target, and sputtering target manufactured from such chromic oxide powder

Applicants:

Hideo Takami, Ibaraki, JP;

Masataka Yahagi, Ibaraki, JP;

Inventors:

Hideo Takami, Ibaraki, JP;

Masataka Yahagi, Ibaraki, JP;

Assignee:

JX Nippon Mining & Metals Corporation, Tokyo, JP;

Attorney:

Howson & Howson LLP

Primary Examiner:

Michael Band

Int. Cl.
CPC ...
C23C 14/00 (2006.01); C25B 9/00 (2006.01); C25B 11/00 (2006.01); C25B 13/00 (2006.01); C04B 35/00 (2006.01); C09D 5/23 (2006.01); H01F 1/00 (2006.01); H01L 29/12 (2006.01); C22C 32/00 (2006.01); C01G 37/033 (2006.01); C23C 14/34 (2006.01); C04B 35/645 (2006.01); C04B 35/12 (2006.01); C04B 35/626 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C01G 37/033 (2013.01); C04B 35/645 (2013.01); C04B 2235/3251 (2013.01); C04B 2235/77 (2013.01); C04B 2235/72 (2013.01); C04B 2235/446 (2013.01); C04B 35/12 (2013.01); C04B 2235/726 (2013.01); C01P 2006/80 (2013.01); C01P 2004/61 (2013.01); C04B 35/62645 (2013.01); C04B 2235/5436 (2013.01); C04B 2235/721 (2013.01); C04B 2235/724 (2013.01);
Abstract

Provided is chromic oxide powder for a sputtering target comprised of chromic oxide wherein sulfur is 100 wtppm or less. This sputtering target contains chromic oxide of 5 molar % or higher or chromic oxide, wherein the sulfur content in the sputtering target is 100 wtppm or less, and the purity excluding gas components of moisture, carbon, nitrogen and sulfur is 99.95 wt % or higher. The chromic oxide powder for a sputtering target is able to increase the purity of the chromic oxide itself as well as increase the sintered density upon manufacturing a sputtering target. As a result of manufacturing a sputtering target using this chromic oxide powder, the crystal grains are refined, and provided is a uniform and dense sputtering target that does not generate cracks.

Find Patent Forward Citations

Loading…