The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Jun. 14, 2011
Christopher G. Gallagher, Baltimore, MD (US);
Christopher G. Gallagher, Baltimore, MD (US);
Other;
Abstract
A dimpled fabric creation system and method is provided to form a dimpled fabric using a mold or machine having a plurality of protrusions and grooves, while avoiding the repetitive steps to manually shape each protrusion individually by tying portions of fabric individually. The protrusions may be of complex three dimensional shapes to form dimples in the fabric having corresponding complex three dimensional shapes. The system and method provide for creation of a dimpled fabric container, wherein the dimpled fabric container may be utilized in gift wrapping.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile