The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Mar. 26, 2012
Yuya Haneda, Nagano, JP;
Ryoichi Nozawa, Nagano, JP;
Yuya Haneda, Nagano, JP;
Ryoichi Nozawa, Nagano, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A pattern forming method includes: performing a first droplet ejection step by ejecting droplets containing 0.1%-2% polysiloxane by mass onto a substrate; performing a first layer forming step by solidifying the droplets ejected onto the substrate so that a first layer is formed; performing a second droplet ejection step by ejecting more droplets over the first layer; and performing a second layer forming step by solidifying the droplets ejected onto the first layer so that a second layer is formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile