The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Mar. 18, 2011
Applicants:

Hindrik Freerk Bulthuis, Apeldoorn, NL;

Paula Mcdade, Glasgow, GB;

Gunter B. Beelen, Zoutleeuw, BE;

Inventors:

Hindrik Freerk Bulthuis, Apeldoorn, NL;

Paula McDade, Glasgow, GB;

Gunter B. Beelen, Zoutleeuw, BE;

Assignee:

Gemfire Corporation, Newark, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/34 (2006.01); G02B 6/26 (2006.01); G02B 6/10 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
G02B 6/12011 (2013.01); G02B 6/12028 (2013.01);
Abstract

In one aspect of the invention, roughly stated, Applicants have discovered that a compensation material within slot elongated in a direction parallel to a segment of waveguide in an arrayed waveguide grating apparatus can compensate for both first and second order change in refractive index of the base waveguide material over temperature. Unlike the transverse slots of conventional linear athermalization techniques, the elongated slot generally parallel to the base material defines a composite waveguide section having a second order effective index of refraction temperature dependency which can be utilized to accurately minimize the temperature dependence of the overall optical path length to both the first and second order. The techniques described herein are also generalizeable to neutralization of the optical path length temperature dependence to any order.


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