The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Jan. 07, 2013
Applicant:

Imagineering, Inc., Kobe, JP;

Inventors:

Yuji Ikeda, Kobe, JP;

Minoru Makita, Kobe, JP;

Assignee:

IMAGINEERING, Inc., Kyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F23Q 3/00 (2006.01); H05H 1/46 (2006.01); F02P 23/04 (2006.01); F02P 3/01 (2006.01); H05H 1/50 (2006.01);
U.S. Cl.
CPC ...
H05H 1/50 (2013.01); H05H 1/46 (2013.01); H05H 2001/466 (2013.01); F02P 23/04 (2013.01); F02P 3/01 (2013.01);
Abstract

The plasma generation deviceis provided with a high frequency generation devicethat generates a high frequency wave, and a high frequency radiatorthat radiates the high frequency wave outputted from the high frequency generation deviceto a target space, and generates plasma by supplying energy of the high frequency wave to the target space. In the plasma generation device, the high frequency generation deviceis provided with an oscillatorthat oscillates a high frequency wave, and an amplifierthat amplifies and outputs the high frequency wave oscillated by the oscillatorto the high frequency radiator. In the high frequency generating devicethe amplifieralone is integrated with the high frequency radiator, from among the oscillatorand the amplifier


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