The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Feb. 17, 2012
Christopher Kulla, Los Angeles, CA (US);
Christopher Kulla, Los Angeles, CA (US);
Sony Corporation, Tokyo, JP;
Sony Pictures Technologies Inc., Culver City, CA (US);
Abstract
Provided are systems and methods to perform ray marching for production ray tracing in inhomogeneous participating media. The systems and methods allow a reduction of the quadratic complexity without giving up the benefits of accurate ray traced lighting. In one implementation, the task of ray marching is reformulated into a task of transforming an unknown, spatially varying volume into a collection of piecewise homogeneous segments. Being homogeneous, inexpensive analytical formulas may be employed for evaluating and sampling the transmission term at arbitrary points in the segments.