The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Sep. 24, 2013
Applicant:

Correlated Magnetics Research, Llc., New Hope, AL (US);

Inventors:

Larry W. Fullerton, New Hope, AL (US);

Mark D. Roberts, Huntsville, AL (US);

James L. Richards, Fayetteville, TN (US);

Assignee:

Correlated Magnetics Reserach LLC, Huntsville, AL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01F 7/20 (2006.01); H01F 7/02 (2006.01); G09F 7/04 (2006.01); B42F 1/06 (2006.01); H01F 7/00 (2006.01); B42F 1/00 (2006.01);
U.S. Cl.
CPC ...
H01F 7/02 (2013.01); H01F 7/0252 (2013.01); G09F 7/04 (2013.01); H01F 7/0242 (2013.01); B42F 1/06 (2013.01); H01F 7/00 (2013.01); H01F 7/0263 (2013.01); B42F 1/00 (2013.01);
Abstract

An improved field emission system and method is provided that involves field emission structures having irregular polarity patterns defined in accordance with one-dimensional codes, where an irregular polarity pattern is at least one of an asymmetrical polarity pattern or an uneven polarity pattern. Such one-dimensional codes define at least one peak force and a plurality of off peak spatial forces corresponding to a plurality of alignments of said first and second field emission structures per code modulo, where a peak force is a spatial force produced when all aligned field emission sources produce an attractive force or all aligned field emission sources produce a repellant force and an off peak spatial force is a spatial force resulting from cancellation of at least one attractive force by at least one repellant force.


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