The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Apr. 27, 2011
Applicants:

Jin-kyun Lee, Incheon, KR;

Alexander Zakhidov, Ithaca, NY (US);

John Defranco, Ithaca, NY (US);

Inventors:

Jin-Kyun Lee, Incheon, KR;

Alexander Zakhidov, Ithaca, NY (US);

John DeFranco, Ithaca, NY (US);

Assignees:

Orthogonal, Inc., Rochester, NY (US);

Cornell University, Ithaca, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 51/40 (2006.01); G03F 7/004 (2006.01); H01L 51/56 (2006.01); H01L 51/00 (2006.01); G03F 7/32 (2006.01); H05B 33/10 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 51/56 (2013.01); G03F 7/0046 (2013.01); H01L 27/3281 (2013.01); H01L 51/0018 (2013.01); G03F 7/325 (2013.01); H05B 33/10 (2013.01); H01L 27/3211 (2013.01);
Abstract

A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterened organic light-emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer.


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