The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Jan. 19, 2011
Applicants:
Shunsuke Iriyama, Yokohama, JP;
Kenichi Umishio, Yokohama, JP;
Makoto Tsunenaga, Yokohama, JP;
Shinji Inomata, Yokohama, JP;
Eijiro Adachi, Yokohama, JP;
Inventors:
Shunsuke Iriyama, Yokohama, JP;
Kenichi Umishio, Yokohama, JP;
Makoto Tsunenaga, Yokohama, JP;
Shinji Inomata, Yokohama, JP;
Eijiro Adachi, Yokohama, JP;
Assignee:
Shiseido Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61F 2/10 (2006.01); C12N 5/071 (2010.01); A61L 27/38 (2006.01); A61L 27/60 (2006.01);
U.S. Cl.
CPC ...
A61L 27/60 (2013.01); A61L 27/3886 (2013.01); A61L 27/3813 (2013.01); A61L 27/3804 (2013.01);
Abstract
The present invention relates to a method for producing artificial skin, comprising: adding a matrix metalloproteinase inhibitor and a heparanase inhibitor to an artificial skin formation culture medium comprising human epidermal keratinocytes and human dermal fibroblasts, culturing the cells in the artificial skin formation culture medium, and forming artificial skin.