The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Aug. 02, 2012
Applicants:
Hiroyuki Nishimura, Tokyo, JP;
Yoshihide Nakao, Tokyo, JP;
Tomoya Kawashima, Tokyo, JP;
Keiji Kashima, Tokyo, JP;
Inventors:
Hiroyuki Nishimura, Tokyo, JP;
Yoshihide Nakao, Tokyo, JP;
Tomoya Kawashima, Tokyo, JP;
Keiji Kashima, Tokyo, JP;
Assignee:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract
The present invention pertains to a pattern phase difference film, which is used to display 3D images using a passive system, and provides a method for producing a pattern phase difference film that can be manufactured with high precision, easily and in large quantities. In a mask provided for manufacturing an alignment film, slits, which are provided for exposure treatment, are made so as to gradually narrow toward the ends in the longitudinal direction.