The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Sep. 30, 2011
Renee Kelly Duncan, Corning, NY (US);
Kishor Purushottam Gadkaree, Painted Post, NY (US);
Felipe Miguel Joos, Painted Post, NY (US);
Charles Warren Lander, Wayland, NY (US);
Renee Kelly Duncan, Corning, NY (US);
Kishor Purushottam Gadkaree, Painted Post, NY (US);
Felipe Miguel Joos, Painted Post, NY (US);
Charles Warren Lander, Wayland, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
Water-based conductive ink compositions may include acid-washed graphite particles, carbon black particles, at least one polymeric dispersant, at least one acrylic binder, at least one polyvinylpyrrolidone binder, at least one defoamer, and an aqueous carrier. At least 90 wt. % of the acid-washed graphite particles and the carbon black particles, based on the combined weight of the acid-washed graphite particles and the carbon black particles, may have particle sizes less than 10 μm. The water-based conductive ink composition may have a total elemental contaminant level of less than 100 ppm, based on the total weight of the water-based conductive ink composition. Methods for preparing the water-based conductive ink compositions may include preparing a letdown phase from a first premix containing carbon black and a second premix containing acid-washed graphite. The methods may include washing graphite particles in an strong acid such as hydrochloric acid, nitric acid, sulfuric acid, or mixtures thereof.