The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Feb. 27, 2012
Applicants:
Jeong-hoon Byeon, Incheon, KR;
In-seok Yeo, Seoul, KR;
Jae-hyuk Chang, Seongnam-si, KR;
Seung-jun Lee, Yongin-si, KR;
Hyun-seok Kim, Anyang-si, KR;
Sung-hee Lee, Seoul, KR;
Inventors:
Jeong-Hoon Byeon, Incheon, KR;
In-Seok Yeo, Seoul, KR;
Jae-Hyuk Chang, Seongnam-si, KR;
Seung-Jun Lee, Yongin-si, KR;
Hyun-Seok Kim, Anyang-si, KR;
Sung-Hee Lee, Seoul, KR;
Assignee:
Samsung Display Co., Ltd., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a metal pattern includes forming a precursor layer including a metal precursor on a substrate, irradiating a light on the precursor layer to form a metal seed layer having a predetermined pattern, and electroless-plating the metal seed layer to form a metal pattern layer.