The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Mar. 15, 2012
Applicants:

Malko Gindrat, Wohlen, CH;

Rajiv J. Damani, Winterthur, CH;

Inventors:

Malko Gindrat, Wohlen, CH;

Rajiv J. Damani, Winterthur, CH;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/22 (2006.01); B01D 67/00 (2006.01); B01D 69/12 (2006.01); B01D 71/02 (2006.01); C23C 4/12 (2006.01); C23C 4/04 (2006.01); C23C 4/10 (2006.01);
U.S. Cl.
CPC ...
C23C 4/105 (2013.01); B01D 67/0039 (2013.01); B01D 53/22 (2013.01); C23C 4/127 (2013.01);
Abstract

A plasma spray method for the manufacture of an ion conductive membrane is provided which ion conductive membrane has an ion conductivity, in which method the membrane is deposited as a layer () onto a substrate () in a process chamber, wherein a starting material (P) is sprayed onto a surface of the substrate () in the form of a process beam () by means of a process gas (G), wherein the starting material is injected into a plasma at a low process pressure, which is at most 10,000 Pa, and is partially or completely molten there. Oxygen (O) is supplied to the process chamber () during the spraying at a flow rate which amounts to at least 1%, preferably at least 2%, of the overall flow rate of the process gas.


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