The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Jan. 29, 2013
Applicant:

Hewlett-packard Development Company, L.p., Houston, TX (US);

Inventors:

Andreas Müller, Barcelona, ES;

Utpal Kumar Sarkar, Sant Quirze del Valles, ES;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 29/38 (2006.01); H04N 1/46 (2006.01); B41J 2/13 (2006.01);
U.S. Cl.
CPC ...
B41J 2/13 (2013.01);
Abstract

A method and apparatus for processing image data is described. An example of a method involves applying a first mask to image data corresponding to an overlap zone of a first print region, the first mask representing a first mask pattern and applying a second mask to image data corresponding to the overlap zone of a second print region, the second mask representing a second mask pattern. Each of the first and second mask patterns define a periodic variation in a dimension corresponding to the first direction. First and second mask patterns for at least a second image plane are spatially separated in the dimension corresponding to the first direction in relation to first and second patterns of a first image plane.


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