The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Jan. 22, 2007
Andreas Gross, Gustavsburg, DE;
Hildegard Roemer, Floersheim, DE;
Norbert Greulich-hickmann, Mainz, DE;
Guido Raeke, Pfaffen-Schwabenheim, DE;
Guenter Weidmann, Flonheim, DE;
Thomas Stelle, Mainz, DE;
Volker Ohmstede, Bingen, DE;
Wolfgang Jost, Mainz, DE;
Andreas Gross, Gustavsburg, DE;
Hildegard Roemer, Floersheim, DE;
Norbert Greulich-Hickmann, Mainz, DE;
Guido Raeke, Pfaffen-Schwabenheim, DE;
Guenter Weidmann, Flonheim, DE;
Thomas Stelle, Mainz, DE;
Volker Ohmstede, Bingen, DE;
Wolfgang Jost, Mainz, DE;
Schott AG, , DE;
Abstract
For permitting temperature manipulation of a melt even at a conductivity below 10Ωcmand thus permitting refining of the melt at temperatures about 1700° C., the invention provides a method and a device for temperature manipulation of a melt (), in particular in a refiner unit. The melt () is heated at least by ohmic resistance heating with at least two electrodes () that are arranged in the melt (). At least a part of the melt () is cooled. The device () for temperature manipulation, refining, purification and homogenisation of a melt () comprises at least one arrangement for accommodating melt material (), defining an inner chamber, and at least two electrodes () for ohmic resistance heating of the melt (). The electrodes () project into the inner chamber of the arrangement, in particular of a vessel ().