The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Jun. 22, 2010
Applicants:

Richard A. Steenblik, Aipharetta, GA (US);

Mark J. Hurt, Duluth, GA (US);

Samuel M. Cape, Woodstock, GA (US);

Gregory R. Jordan, Cumming, GA (US);

Inventors:

Richard A. Steenblik, Aipharetta, GA (US);

Mark J. Hurt, Duluth, GA (US);

Samuel M. Cape, Woodstock, GA (US);

Gregory R. Jordan, Cumming, GA (US);

Assignee:

Visual Physics, LLC, Alpharetta, GA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G02B 3/00 (2006.01); B42D 15/00 (2006.01); G02B 27/22 (2006.01); D21H 21/44 (2006.01);
U.S. Cl.
CPC ...
B42D 15/0013 (2013.01); G02B 3/0031 (2013.01); B42D 2035/20 (2013.01); G02B 3/0056 (2013.01); B42D 2035/28 (2013.01); B42D 15/0026 (2013.01); G02B 27/2214 (2013.01); B42D 2035/44 (2013.01); D21H 21/44 (2013.01);
Abstract

A system for projecting one or more synthetic optical images, which demonstrates improved resistance to optically degrading external effects, is provided. The inventive system serves to lock the focal length of the focusing elements in place. In other words, no other transparent materials or layers brought into contact with the inventive system will serve to materially alter the focal length or the optical acuity of synthetic images formed by the system.


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