logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8867019 B1

PDFFull Text
Expired
Date of Patent:
Oct. 21, 2014

Filed:

Sep. 26, 2012

Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method

Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Masato Kumazawa, Sagamihara, JP;

Tatsuo Fukui, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Peter B Kim

Assistant Examiner:

Deoram Persaud

Int. Cl.
CPC ...
G03B 27/44 (2006.01); G03B 27/00 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); G02B 17/08 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G02B 17/0804 (2013.01); G03F 7/70791 (2013.01); G03F 1/144 (2013.01); G03F 9/7084 (2013.01); G03F 7/70275 (2013.01);
Abstract

An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PLfor forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PLfor forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Find Patent Forward Citations

Kumazawa, Masato. (2014). Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method (U.S. Patent No. 8867019). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8867019

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…