The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2014
Filed:
Oct. 26, 2011
Fung-hsu Wu, Gueishan Township, Taoyuan County, TW;
Lung-hai Wu, Taoyuan, TW;
Fung-Hsu Wu, Gueishan Township, Taoyuan County, TW;
Lung-Hai Wu, Taoyuan, TW;
Benq Materials Corp., Gueishan Township, Taoyuan County, TW;
Abstract
A patterned retardation film including a base substrate, a patterned resin layer and a liquid crystal layer is provided. The patterned resin layer having plurality of first areas and a plurality of second areas is disposed on the base substrate. The combination of the first and second areas is a grating-like stripe structure. The patterned resin layer includes an aligning micron structure. The aligning micron structure includes a plurality of first sub micron grooves and a plurality of second sub micron grooves respectively located in the first areas and the second areas. The liquid crystal layer is disposed on the patterned resin layer and aligned with the aligning micron structure. The liquid crystal layer disposed above the first areas provides a first phase retardation. The liquid crystal layer disposed above the second areas provides a second phase retardation.