The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2014
Filed:
May. 26, 2004
Xiangxin BI, San Ramon, CA (US);
Herman A. Lopez, San Jose, CA (US);
Prasad Narasimha, Bangalore, IN;
Eric Euvrard, Brookline, MA (US);
Ronald J. Mosso, Fremont, CA (US);
Xiangxin Bi, San Ramon, CA (US);
Herman A. Lopez, San Jose, CA (US);
Prasad Narasimha, Bangalore, IN;
Eric Euvrard, Brookline, MA (US);
Ronald J. Mosso, Fremont, CA (US);
NeoPhotonics Corporation, San Jose, CA (US);
Abstract
High rate deposition methods comprise depositing a powder coating from a product flow. The product flow results from a chemical reaction within the flow. Some of the powder coatings consolidate under appropriate conditions into an optical coating. The substrate can have a first optical coating onto which the powder coating is placed. The resulting optical coating following consolidation can have a large index-of-refraction difference with the underlying first optical coating, high thickness and index-of-refraction uniformity across the substrate and high thickness and index-of-refraction uniformity between coatings formed on different substrates under equivalent conditions. In some embodiments, the deposition can result in a powder coating of at least about 100 nm in no more than about 30 minutes with a substrate having a surface area of at least about 25 square centimeters.