The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Mar. 30, 2010
Applicants:

Joel R. Dufresne, St. Paul, MN (US);

Bryan C. Feisel, Hudson, WI (US);

Theresa J. Gerten, Eagan, MN (US);

Brent R. Hansen, New Richmond, WI (US);

David D. Nguyen, Savage, MN (US);

Inventors:

Joel R. Dufresne, St. Paul, MN (US);

Bryan C. Feisel, Hudson, WI (US);

Theresa J. Gerten, Eagan, MN (US);

Brent R. Hansen, New Richmond, WI (US);

David D. Nguyen, Savage, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 3/00 (2006.01); B01L 3/00 (2006.01); G01N 21/03 (2006.01);
U.S. Cl.
CPC ...
B01L 3/502715 (2013.01); G01N 21/0303 (2013.01); Y10S 436/809 (2013.01); B01L 3/502707 (2013.01); B01L 2300/0864 (2013.01); B01L 2300/0816 (2013.01); B01L 2300/168 (2013.01); B01L 2200/12 (2013.01); B01L 2300/0812 (2013.01); B01L 2300/0887 (2013.01);
Abstract

Sample processing devices that include transmissive layers and control layers to reduce or eliminate cross-talk between process chambers in the processing device are disclosed. The transmissive layers may transmit significant portions of signal light and/or interrogation light while the control layers block significant portions of signal light and/or interrogation light. Methods of manufacturing processing devices that include transmissive layers and control layers are also disclosed. The methods may involve continuous forming processes including co-extrusion of materials to form the transmissive layer and control layer in a processing device, followed by formation of the process chambers in the control layer. Alternatively, the methods may involve extrusion of materials for the control layer, followed by formation of process chambers in the control layer.


Find Patent Forward Citations

Loading…