The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Jul. 19, 2012
Applicants:

Yasuhiro Okubo, Isehara, JP;

Toshiya Abe, Isehara, JP;

Kei Onoma, Isehara, JP;

Atsushi Igari, Isehara, JP;

Inventors:

Yasuhiro Okubo, Isehara, JP;

Toshiya Abe, Isehara, JP;

Kei Onoma, Isehara, JP;

Atsushi Igari, Isehara, JP;

Assignee:

Ichikoh Industries, Ltd., Isehara-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 13/10 (2006.01); F21S 8/10 (2006.01);
U.S. Cl.
CPC ...
F21S 48/1159 (2013.01); F21S 48/1784 (2013.01); F21S 48/137 (2013.01);
Abstract

The present invention is provided with a first lamp unitand a second lamp unit. The first lamp unitis provided with a semiconductor-type light source, a reflector, a shade, and a driving mechanism. The reflectorhas a first reflection surfaceand a second reflection surface. The first reflection surfaceis adapted to emit lateral light distribution patterns CPL and CPR. The second reflection surfaceis adapted to emit a light distribution pattern HP for high beam. As a result, according to the present invention, it becomes possible to obtain an arbitrary auxiliary light distribution pattern, such as a light distortion pattern for spot or a light distribution pattern for scattering other than the lateral light distribution patterns CPL and CPR.


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