The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Oct. 21, 2013
National Tsing Hua University, Hsinchu, TW;
Chen-Fu Chien, Hsinchu, TW;
Jei-Zheng Wu, Hsinchu, TW;
National Tsing Hua University, Hsinchu, TW;
Abstract
The present invention relates to a photolithography capacity planning system and a non-transitory computer readable media thereof. The photolithography capacity planning system includes a cost calculation module, a capacity calculation module, a demand calculation module, and a data processing module. The cost calculation module calculates a production cost, an unfulfilled demand cost, and a mask cost of the photolithography manufacturing process. The capacity calculation module calculates a capacity of light sources, a capacity of shared equipments, and a capacity of specified equipments of the photolithography manufacturing process. The demand calculation module calculates a quantity of unfulfilled demand. The data processing module produces a planning result.