The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2014

Filed:

Dec. 06, 2011
Applicants:

Jean Seydoux, Rio de Janeiro, BR;

Andrei I. Davydychev, Sugar Land, TX (US);

Denis Heliot, Sugar Land, TX (US);

Bennett N. Nicholas, Hamden, CT (US);

Inventors:

Jean Seydoux, Rio de Janeiro, BR;

Andrei I. Davydychev, Sugar Land, TX (US);

Denis Heliot, Sugar Land, TX (US);

Bennett N. Nicholas, Hamden, CT (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G01V 3/20 (2006.01); G01V 3/18 (2006.01); G01V 3/38 (2006.01);
U.S. Cl.
CPC ...
G01V 3/20 (2013.01); G01V 3/18 (2013.01); G01V 3/38 (2013.01);
Abstract

A method and system for producing look-ahead profiles measurements includes positioning an energy transmitter, such as a transmitting antenna, proximate to a borehole assembly tool. One or more energy receivers, such as receiving antennas, are positioned along a length of the borehole assembly. Next, energy is transmitted to produce look-ahead scans relative to the borehole assembly tool. Look-ahead graph data with an x-axis being a function of a time relative to the position of the borehole assembly tool is generated. The look-ahead graph is produced and displayed on a display device. The look-ahead graph may track estimated formation values based on earth models. The estimated formation values are displayed below a tool position history line that is part of the look-ahead graph. The estimated formation values in the look-ahead graph may be based on inversions of resistivity data from the look-ahead scans.


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