The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2014

Filed:

Oct. 10, 2011
Applicant:

Ramlah Binte Abdul Razak, Plano, TX (US);

Inventor:

Ramlah Binte Abdul Razak, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 24/06 (2013.01); H01L 2924/3511 (2013.01); H01L 224/81191 (2013.01); H01L 24/05 (2013.01); H01L 2224/0616 (2013.01); H01L 2224/1703 (2013.01); H01L 24/14 (2013.01); H01L 2224/16238 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/05022 (2013.01); H01L 2224/1403 (2013.01); H01L 2224/16227 (2013.01); H01L 2924/15311 (2013.01); H01L 2224/05555 (2013.01); H01L 2224/81815 (2013.01); H01L 224/0603 (2013.01); H01L 2224/05572 (2013.01); H01L 2224/09104 (2013.01); H01L 24/13 (2013.01); H01L 24/16 (2013.01);
Abstract

A semiconductor die includes a first contact stack including a first die pad having a first pad perimeter, a first via through a dielectric layer to the first die pad having a first via perimeter, and a first UBM pad contacting the first die pad through the first via having a first UBM pad perimeter. A second contact stack includes a second die pad having a second pad perimeter shorter than the first pad perimeter, a second via through the dielectric layer to the second die pad having a second via perimeter shorter than the first via perimeter, and a second UBM pad contacting the second die pad through the second via having a second UBM pad perimeter that is shorter than the first UBM pad perimeter.


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