The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
May. 17, 2013
Applicants:
Man Ho Han, Incheon, KR;
Jong Kyoung Park, Incheon, KR;
Hyun Jin Kim, Incheon, KR;
Jae Hyun Kim, Incheon, KR;
Inventors:
Man Ho Han, Incheon, KR;
Jong Kyoung Park, Incheon, KR;
Hyun Jin Kim, Incheon, KR;
Jae Hyun Kim, Incheon, KR;
Assignee:
Dongjin Semichem Co., Ltd., , KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/11 (2006.01); C09D 135/00 (2006.01); C09D 145/00 (2006.01); C08F 22/06 (2006.01); C09D 133/10 (2006.01); C08F 32/00 (2006.01); C08L 45/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C09D 135/00 (2013.01); C09D 145/00 (2013.01); C08F 22/06 (2013.01); C09D 133/10 (2013.01); C08F 32/00 (2013.01); C08L 45/00 (2013.01);
Abstract
A polymer compound and a resist protective film composition for an immersion lithography process including the same.
Han, Man. (2014). Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process (U.S. Patent No. 8859194). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8859194
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile