The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Sep. 04, 2013
Sandia Corporation, Albuquerque, NM (US);
Shawn M. Dirk, Albuquerque, NM (US);
Ross Stefan Johnson, Wilmington, DE (US);
Robert Boye, Albuquerque, NM (US);
Michael R. Descour, Albuquerque, NM (US);
William C. Sweatt, Albuquerque, NM (US);
David R. Wheeler, Albuquerque, NM (US);
Bryan James Kaehr, Albuquerque, NM (US);
Sandia Corporation, Albuquerque, NM (US);
Abstract
Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of Δn≧1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.