The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2014

Filed:

Sep. 13, 2012
Applicants:

Kun-ping Huang, Miaoli County, TW;

Chih-chen Chang, New Taipei, TW;

Yu-tse Hsieh, Taoyuan County, TW;

Po-wen Chiu, Hsinchu, TW;

Henry Medina, Hsinchu, TW;

Inventors:

Kun-Ping Huang, Miaoli County, TW;

Chih-Chen Chang, New Taipei, TW;

Yu-Tse Hsieh, Taoyuan County, TW;

Po-Wen Chiu, Hsinchu, TW;

Henry Medina, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/26 (2006.01); C23C 16/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a method of forming a graphene layer, including: putting a substrate in a chamber of an electron cyclotron resonance device, and then evacuating the chamber. Conducting a carbon-containing gas into the chamber, wherein the carbon-containing gas has a pressure of 10torr to 10torr in the chamber. Heating the substrate until the substrate has a temperature of 100° C. to 600° C., and using a microwave with an electron cyclotron resonance mechanism to excite the carbon-containing gas to deposit a graphene layer on the substrate.


Find Patent Forward Citations

Loading…