The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Sep. 07, 2012
Akira Watanabe, Kanagawa-ken, JP;
Kaori Kimura, Kanagawa-ken, JP;
Kazutaka Takizawa, Kanagawa-ken, JP;
Takeshi Iwasaki, Tokyo, JP;
Tsuyoshi Onitsuka, Tokyo, JP;
Akihiko Takeo, Tokyo, JP;
Akira Watanabe, Kanagawa-ken, JP;
Kaori Kimura, Kanagawa-ken, JP;
Kazutaka Takizawa, Kanagawa-ken, JP;
Takeshi Iwasaki, Tokyo, JP;
Tsuyoshi Onitsuka, Tokyo, JP;
Akihiko Takeo, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A manufacturing method of a magnetic recording medium includes steps of forming a magnetic recording layer, a first mask layer, a second mask layer containing silicon as primary component, a strip layer, a third mask layer, and a resist layer, a step of patterning the resist layer to provide a pattern, steps of transferring the pattern to the third mask layer, to the strip layer, and to the second mask layer, a step of removing the strip layer by wet etching and of stripping the third mask layer and the resist layer above the magnetic recording layer, steps of transferring the pattern to the first mask layer and to the magnetic recording layer, and a step of stripping the first mask layer remaining on the magnetic recording layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile