The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Nov. 19, 2012
Samsung Corning Precision Materials Co., Ltd., Gumi-si, KR;
Sooho Park, ChungCheongNam-Do, KR;
Seohyun Kim, ChungCheongNam-Do, KR;
Jeongwoo Park, ChungCheongNam-Do, KR;
Taejung Park, ChungCheongNam-Do, KR;
Young Zo Yoo, ChungCheongNam-Do, KR;
GunSang Yoon, ChungCheongNam-Do, KR;
Eun-Ho Choi, ChungCheongNam-Do, KR;
Myong Woon Kim, ChungCheongNam-Do, KR;
Bogyeong Kim, ChungCheongNam-Do, KR;
Hyung Soo Shin, ChungCheongNam-Do, KR;
Seung Ho Yoo, ChungCheongNam-Do, KR;
Sang Do Lee, ChungCheongNam-Do, KR;
Sang Ick Lee, ChungCheongNam-Do, KR;
Sang Jun Yim, ChungCheongNam-Do, KR;
Samsung Corning Precision Materials Co., Ltd., Gumi-Si, Gyeongsangbuk-Do, KR;
Abstract
A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains an alkyl zinc halide having the following formula: R—Zn—X, where R is an alkyl group CH, and X is a halogen group. The n is a number ranging from 1 to 4, and the alkyl group is one selected from among a methyl group, an ethyl group, an i-propyl group and a t-butyl group. The halogen group contains one selected from among F, Br, Cl and I. A method of depositing a zinc oxide-based thin film includes loading a substrate into a deposition chamber; and supplying the zinc oxide precursor which contains the above-described alkyl zinc halide and an oxidizer into the deposition chamber and forming a zinc oxide-based thin film on the substrate via chemical vapor deposition. The zinc oxide-based thin film is deposited on the substrate via atmospheric pressure chemical vapor deposition.