The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2014

Filed:

Nov. 22, 2010
Applicants:

Bing Liu, Ann Arbor, MI (US);

Zhendong HU, Ann Arbor, MI (US);

Yong Che, Ann Arbor, MI (US);

Makoto Murakami, Ann Arbor, MI (US);

Inventors:

Bing Liu, Ann Arbor, MI (US);

Zhendong Hu, Ann Arbor, MI (US);

Yong Che, Ann Arbor, MI (US);

Makoto Murakami, Ann Arbor, MI (US);

Assignee:

IMRA America, Inc., Ann Arbor, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 9/14 (2006.01); B01J 19/12 (2006.01); B22F 9/04 (2006.01); B22F 1/00 (2006.01);
U.S. Cl.
CPC ...
B01J 19/121 (2013.01); B22F 2999/00 (2013.01); B22F 1/0018 (2013.01); B22F 9/04 (2013.01); Y10S 977/889 (2013.01);
Abstract

A method for generating nanoparticles in a liquid comprises generating groups of ultrafast laser pulses, each pulse in a group having a pulse duration of from 10 femtoseconds to 200 picoseconds, and each group containing a plurality of pulses with a pulse separation of 1 to 100 nanoseconds and directing the groups of pulses at a target material in a liquid to ablate it. The multiple pulse group ablation produces nanoparticles with a reduced average size, a narrow size distribution, and improved production efficiency compared to prior pulsed ablation systems.


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