The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2014

Filed:

Mar. 15, 2012
Applicants:

Takanobu Miyashita, Tsukuba, JP;

Yasuyuki Goto, Tsukuba, JP;

Ryousuke Kushibiki, Tsukuba, JP;

Masahiro Aono, Tsukuba, JP;

Masahiro Nishiura, Tsukuba, JP;

Inventors:

Takanobu Miyashita, Tsukuba, JP;

Yasuyuki Goto, Tsukuba, JP;

Ryousuke Kushibiki, Tsukuba, JP;

Masahiro Aono, Tsukuba, JP;

Masahiro Nishiura, Tsukuba, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22C 30/00 (2006.01); C23C 24/04 (2006.01); C23C 14/34 (2006.01); C22C 1/04 (2006.01); C22C 5/04 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); B22F 2999/00 (2013.01); C22C 1/0466 (2013.01); B22F 2998/10 (2013.01); C22C 5/04 (2013.01);
Abstract

An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target.


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