The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Feb. 12, 2013
Hitachi Metals, Ltd., Tokyo, JP;
Takao Goto, Kuwana, JP;
Makoto Tanaka, Mie, JP;
Hitachi Metals, Ltd., Tokyo, JP;
Abstract
A process and device enabling accurate mass flow control is described. A mass flow controller can be re-specified corresponding to multiple types of actual process gases and multiple flow rate ranges, even after the mass flow controller has been shipped. Calibration gas data is derived using actual flow rate versus a flow rate setting signal to generate calibration gas data. Actual gas data is derived by measuring actual flow rate versus a flow rate setting signal for each actual gas and saving. Subsequently, prior to operating the mass flow rate control device, the characteristic data for an actual and the calibration gas characteristic data is recalled. The calibration gas characteristic data is then converted to controlled flow rate correction data based on the actual gas characteristic data that is saved to the control unit and the actual gas flow rate is corrected based on this controlled flow rate correction data.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile