The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Jun. 10, 2010
Klaus Juergen Engel, Aachen, DE;
Dieter Geller, Aachen, DE;
Gereon Vogtmeier, Aachen, DE;
Koninklijke Philips N.V., Eindhoven, NL;
Abstract
The present invention generally refers to a correction method for grating-based X-ray differential phase contrast imaging (DPCI) as well as to an apparatus which can advantageously be applied in X-ray radiography and tomography for hard X-ray DPCI of a sample object or an anatomical region of interest to be scanned. More precisely, the proposed invention provides a suitable approach that helps to enhance the image quality of an acquired X-ray image which is affected by phase wrapping, e.g. in the resulting Moiré interference pattern of an emitted X-ray beam in the detector plane of a Talbot-Lau type interferometer after diffracting said X-ray beam at a phase-shifting beam splitter grating. This problem, which is further aggravated by noise in the obtained DPCI images, occurs if the phase between two adjacent pixels in the detected X-ray image varies by more than π radians and is effected by a line integration over the object's local phase gradient, which induces a phase offset error of π radians that leads to prominent line artifacts parallel to the direction of said line integration.