The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Mar. 02, 2012
Applicants:
Hoi Sing Kwok, Hong Kong, CN;
Yuet Wing LI, Hong Kong, CN;
Man Chun Tseng, Hong Kong, CN;
Inventors:
Assignee:
The Hong Kong University of Science and Technology, Hong Kong, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01); G02F 1/141 (2006.01); G02F 1/29 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133753 (2013.01); G02F 2001/133761 (2013.01); G02F 2001/294 (2013.01); G02F 1/133788 (2013.01); G02F 1/29 (2013.01); G02F 1/133723 (2013.01);
Abstract
A method of producing spatially varying pretilt angles across a liquid crystal cell coats a substrate with a polyimide alignment layer and a layer of photoalignment material on top of the polyimide layer. An applied beam with variable light dosage spatial or temporal profiles is then used to achieve a corresponding pretilt angle distribution.