The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2014

Filed:

Nov. 28, 2008
Applicants:

Tsuyoshi Yokoyama, Tokyo, JP;

Shinji Taniguchi, Tokyo, JP;

Masafumi Iwaki, Tokyo, JP;

Motoaki Hara, Tokyo, JP;

Takeshi Sakashita, Tokyo, JP;

Tokihiro Nishihara, Tokyo, JP;

Masanori Ueda, Tokyo, JP;

Inventors:

Tsuyoshi Yokoyama, Tokyo, JP;

Shinji Taniguchi, Tokyo, JP;

Masafumi Iwaki, Tokyo, JP;

Motoaki Hara, Tokyo, JP;

Takeshi Sakashita, Tokyo, JP;

Tokihiro Nishihara, Tokyo, JP;

Masanori Ueda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 9/54 (2006.01); H03H 3/04 (2006.01); H03H 9/56 (2006.01); H03H 9/17 (2006.01);
U.S. Cl.
CPC ...
H03H 9/173 (2013.01); H03H 9/564 (2013.01); H03H 9/568 (2013.01); H03H 2003/0414 (2013.01); H03H 2003/0428 (2013.01); H03H 3/04 (2013.01);
Abstract

A method of manufacturing an elastic wave device is provided with a lamination step of forming, on a substrate (), a plurality of elastic wave devices, each of which includes a lower electrode (), a piezoelectric film (), and an upper electrode (); a measuring step for measuring the operation frequency distribution of the elastic wave devices on the substrate (); and an adjusting step for forming an adjusting region, in which the thickness of the elastic wave device is different from the thicknesses of other portions in a resonance portion of each elastic wave device, corresponding with the distribution of the operation frequencies. The adjusting region is formed so that the size of the area of the adjusting region of the resonator portion of each elastic wave device is different in accordance with the operation frequency distribution that is measured. Thus, the frequency characteristics of the elastic wave devices are easily adjusted by a small number of steps.


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