The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Dec. 20, 2011
Applicants:
Jung-hoon OH, Chungcheongnam-do, KR;
Joon Hee Han, Chungcheongnam-do, KR;
Tae Gon Kim, Chungcheongnam-do, KR;
Hyun Sang Joo, Daejeon, KR;
Inventors:
Jung-Hoon Oh, Chungcheongnam-do, KR;
Joon Hee Han, Chungcheongnam-do, KR;
Tae Gon Kim, Chungcheongnam-do, KR;
Hyun Sang Joo, Daejeon, KR;
Assignee:
Korea Kumho Petrochemical Co., Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 63/668 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
C08G 63/668 (2013.01); G03F 7/2039 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01);
Abstract
Provided is a copolymer. The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.
Oh, Jung-Hoon. (2014). Polymer, method for producing the same, and resist composition containing the same (U.S. Patent No. 8853345). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8853345
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