The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Feb. 01, 2013
Hannstar Display Corporation, New Taipei, TW;
Po-Hsiao Chen, Yunlin County, TW;
Chien-Hao Wu, Tainan, TW;
Rong-Bing Wu, Kaohsiung, TW;
Chang-Ming Chao, Taichung, TW;
Hannstar Display Corporation, New Taipei, TW;
Abstract
A method for manufacturing pixel structure is provided. A patterned conductor layer including a gate, a scan line and a conductor pattern is formed on a substrate. A gate insulating layer, a metal oxide material layer and an etching stop material layer are formed on the substrate. Using the patterned conductor layer as mask, a patterned photoresist layer is formed on the etching stop material layer through a back exposure process. Using the patterned photoresist layer as mask, a metal oxide channel layer and an etching stop layer are formed above the gate. A source and a drain are formed on the etching stop layer. A passivation layer is formed on the substrate. A halftone mask is used to form a photosensitive layer on the passivation layer. The metal oxide material layer and the etching stop material layer on the scan line and the conductor pattern are removed.