The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Apr. 12, 2012
Frank Jakubowski, Dresden, DE;
Jorg Radecker, Dresden, DE;
Frank Ludwig, Dresden, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
Generally, the present disclosure is directed to various methods of recessing an active region and an adjacent isolation structure in a common etch process. One illustrative method disclosed includes forming an isolation structure in a semiconducting substrate, wherein the isolation structure defines an active area in the substrate, forming a patterned masking layer above the substrate, wherein the patterned masking layer exposes the active area and at least a portion of the isolation structure for further processing, and performing a non-selective dry etching process on the exposed active area and the exposed portion of the isolation structure to define a recess in the substrate and to remove at least some of the exposed portions of the isolation structure.