The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2014

Filed:

Aug. 29, 2012
Applicants:

Alfredo M. Morales, Livermore, CA (US);

Richard J. Anderson, Oakland, CA (US);

Nancy Y. C. Yang, Lafayette, CA (US);

Jack L. Skinner, Butte, MT (US);

Michael J. Rye, Los Lunas, NM (US);

Inventors:

Alfredo M. Morales, Livermore, CA (US);

Richard J. Anderson, Oakland, CA (US);

Nancy Y. C. Yang, Lafayette, CA (US);

Jack L. Skinner, Butte, MT (US);

Michael J. Rye, Los Lunas, NM (US);

Assignee:

Sandia Corporation, Albuquerque, NM (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 29/15 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method including forming a diamond material on the surface of a substrate; forming a first contact and a separate second contact; and patterning the diamond material to form a nanowire between the first contact and the second contact. An apparatus including a first contact and a separate second contact on a substrate; and a nanowire including a single crystalline or polycrystalline diamond material on the substrate and connected to each of the first contact and the second contact.


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