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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8852962 B1

PDFFull Text
Expired
Date of Patent:
Oct. 07, 2014

Filed:

Oct. 24, 2012

Apparatus and methods for silicon oxide cvd resist planarization

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Steven Verhaverbeke, San Francisco, CA (US);

Roman Gouk, San Jose, CA (US);

Li-Qun Xia, Cupertino, CA (US);

Mei-yee Shek, Palo Alto, CA (US);

Yu Jin, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Patterson & Sheridan, LLP

Primary Examiner:

Michael Trinh

Int. Cl.
CPC ...
H01L 21/02 (2006.01); G11B 5/74 (2006.01); G11B 5/84 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/033 (2006.01); H01F 41/34 (2006.01);
U.S. Cl.
CPC ...
H01F 41/34 (2013.01); G11B 5/743 (2013.01); G11B 5/84 (2013.01); H01L 21/67161 (2013.01); H01L 21/67736 (2013.01); H01L 21/0332 (2013.01);
Abstract

Embodiments of the present invention provide methods and apparatus for forming a patterned magnetic layer for use in magnetic media. According to embodiments of the present application, a silicon oxide layer formed by low temperature chemical vapor deposition is used to form a pattern in a hard mask layer, and the patterned hard mask is used to form a patterned magnetic layer by plasma ion implantation.

Find Patent Forward Citations

Verhaverbeke, Steven. (2014). Apparatus and methods for silicon oxide cvd resist planarization (U.S. Patent No. 8852962). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8852962

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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