The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Jul. 07, 2011
Ki Hoon Kim, Cheonan-si, KR;
Ji-yong Park, Yongin-si, KR;
Jin-suk Park, Cheonan-si, KR;
Sunghyuk Kim, Cheonan-si, KR;
Min-chang Kim, Cheonan-si, KR;
Kyung Hyun Choi, Cheonan-si, KR;
Ki Hoon Kim, Cheonan-si, KR;
Ji-Yong Park, Yongin-si, KR;
Jin-Suk Park, Cheonan-si, KR;
Sunghyuk Kim, Cheonan-si, KR;
Min-Chang Kim, Cheonan-si, KR;
Kyung Hyun Choi, Cheonan-si, KR;
Samsung Display Co., Ltd., Giheung-Gu, Yongin, Gyeonggi-Do, KR;
Abstract
A photo-mask is capable of preventing stain defects and a method for fabricating a liquid crystal display device using the photo-mask which achieves the same capability. The photo-mask includes a transparent substrate configured to transmit ultraviolet light and a light shielding layer configured to block ultraviolet light on a surface of the transparent substrate. The light shielding layer includes an absorption layer configured to absorb ultraviolet light.