The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2014

Filed:

Feb. 16, 2009
Applicants:

Yukimi Yawata, Okayama, JP;

Keiichi Motoi, Okayama, JP;

Tetsuma Kawakami, Okayama, JP;

Kazuya Yoshimoto, Okayama, JP;

Toru Wada, Okayama, JP;

Inventors:

Yukimi Yawata, Okayama, JP;

Keiichi Motoi, Okayama, JP;

Tetsuma Kawakami, Okayama, JP;

Kazuya Yoshimoto, Okayama, JP;

Toru Wada, Okayama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41N 1/12 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/202 (2013.01);
Abstract

The present invention provides a photosensitive letterpress printing original plate provided with a heat sensitive mask layer having high light blocking effect and durability yet prepared as a thin film. A photosensitive letterpress printing original plate including at least (A) a supporting member, (B) a photosensitive resin layer, and (C) a heat sensitive mask layer that are successively laminated, wherein the heat sensitive mask layer (C) contains carbon black and, as a dispersion binder therefor, a butyral resin as well as polyamide containing polar group selected from the group consisting of polyamide containing a tertiary amine group, polyamide containing a quaternary ammonium salt group, polyamide containing an ether group and polyamide containing a sulfonic group.


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